> In 1991, scientists at Bell Labs published a paper demonstrating the possibility of using a wavelength of 13.8 nm for the so-called soft X-ray projection lithography.[4]
> To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA).[3]
This is a pointless pissing match. It took decades to develop EUV into a high volume tool with R&D effort from different regions that each now contribute to some key part of the tool and supply chain. ASML or Zeiss does not make it a EU technology, the mask and resist does not make it a Japanese technology and Applied Materials does make it a US technology.
Nope, it's not. From your own link:
> In 1991, scientists at Bell Labs published a paper demonstrating the possibility of using a wavelength of 13.8 nm for the so-called soft X-ray projection lithography.[4]
> To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA).[3]
This is a pointless pissing match. It took decades to develop EUV into a high volume tool with R&D effort from different regions that each now contribute to some key part of the tool and supply chain. ASML or Zeiss does not make it a EU technology, the mask and resist does not make it a Japanese technology and Applied Materials does make it a US technology.
If it was Japanese we'd be talking about Canon and Rapidus instead of ASML and TSMC.