Comment by FlowingRiver
2 hours ago
That is it, this is fundamentally a 7nm process leveraged potentially to a 1.4nm (claimed) scale.
Makes you wonder what is possible when applied this to much smaller node sizes. Interesting times ahead.
2 hours ago
That is it, this is fundamentally a 7nm process leveraged potentially to a 1.4nm (claimed) scale.
Makes you wonder what is possible when applied this to much smaller node sizes. Interesting times ahead.
It seems fundamentally easier to do the alignment in the lithography step as you only have get it correct once in the mask instead of correct for every chip every time.