Comment by UltraSane 3 hours ago It moved the complexity from lithography to alignment 2 comments UltraSane Reply FlowingRiver 1 hour ago That is it, this is fundamentally a 7nm process leveraged potentially to a 1.4nm (claimed) scale.Makes you wonder what is possible when applied this to much smaller node sizes. Interesting times ahead. UltraSane 18 minutes ago It seems fundamentally easier to do the alignment in the lithography step as you only have get it correct once in the mask instead of correct for every chip every time.
FlowingRiver 1 hour ago That is it, this is fundamentally a 7nm process leveraged potentially to a 1.4nm (claimed) scale.Makes you wonder what is possible when applied this to much smaller node sizes. Interesting times ahead. UltraSane 18 minutes ago It seems fundamentally easier to do the alignment in the lithography step as you only have get it correct once in the mask instead of correct for every chip every time.
UltraSane 18 minutes ago It seems fundamentally easier to do the alignment in the lithography step as you only have get it correct once in the mask instead of correct for every chip every time.
That is it, this is fundamentally a 7nm process leveraged potentially to a 1.4nm (claimed) scale.
Makes you wonder what is possible when applied this to much smaller node sizes. Interesting times ahead.
It seems fundamentally easier to do the alignment in the lithography step as you only have get it correct once in the mask instead of correct for every chip every time.